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The vertical vacuum diffusion furnace equipment can be applied in various fields such as integrated circuits, discrete components, power semiconductor wafers, power electronics, POWER, MEMS, etc. It is suitable for diffusion, GPP, annealing, alloying, and other processes for 4-8 inch silicon wafers.

The diffusion process involves inserting impurity elements into the silicon substrate at high temperatures using thermal diffusion principles to achieve specific concentration distributions, thereby altering the electrical properties of the material and forming semiconductor device structures. It can be used to create PN junctions or components such as resistors, capacitors, diodes, power semiconductor wafers, and crystal tubes in integrated circuits.

2. Equipment Parameters and Types:

3. Main Features and Advantages of the Equipment

1★ Powerful operational capabilities with a Windows interface and display screen, allowing users to conveniently modify process control parameters and monitor various process statuses in real-time; equipped with fault self-diagnosis software, significantly reducing maintenance time;

2★ Utilizes a reliable industrial control machine + PLC mode for fully automated control of furnace temperature, boat movement, gas flow, and valves, achieving full automation of the entire process;

3★ The program supports manual/automatic operation. After power failure or mid-process shutdown, restarting allows temperature ramping based on the process, saving process time;

4★ Features multiple process pipelines for user convenience;

5★ The cold end uses PT100 to detect ambient temperature for temperature compensation, avoiding the impact of ambient temperature changes on furnace temperature and preventing interlayer interference;

6★ The push-pull boat control employs high-speed pulse closed-loop control to avoid motor step loss and operational jitter. After completing a cycle, the push-pull boat automatically calibrates its position, effectively preventing positioning deviations;

7★ Precise gas flow control with analog signal closed-loop control, strong and weak electrical separation, and standard bus for data exchange to enhance anti-interference capability and ensure data security; gas valves feature a soft-start function;

8★ Includes multiple alarm functions and safety protection features;
9★ Automatic adjustment of the constant temperature zone, cascade control, and accurate control of the actual process temperature in the reaction tube;